CAS 14324-99-3 | Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III)

Name:Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III)
CAS:14324-99-3
Purity:98%
Molecular Formula:Mn(C11H19O2)3
Molecular Weight:604.74
Melting Point:165ºC
Boiling Point:255ºC

Application

Name:Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III)

Synonyms:Tris(dipivaloylmethanato)manganese, Shenvi Hydrogenation Catalyst, Mn(TMHD)3, Mn(dpm)3

CAS:14324-99-3

Purity:98%

Molecular Formula:Mn(C11H19O2)3

Molecular Weight:604.74

Melting Point:165ºC

Boiling Point:255ºC

PSA:78.90

LogP:9.04

Appearance:very dark brown to black powder or crystals

Storage condition:Store at room temperature

InchI:InChI=1S/3C11H20O2.Mn/c3*1-10(2,3)8(12)7-9(13)11(4,5)6;/h3*7,12H,1-6H3;/q;;;+3/p-3/b3*8-7-;

InchI Key:ORZPLLPBZHORSD-LWTKGLMZSA-K

Application:Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III)(CAS:14324-99-3) is usually used as a precursor for metal-organic chemical vapor deposition. This non-precious metal catalyst can be utilized to obtain the thermodynamic hydrogenation product of olefins, selectively. It is also can be applied as a catalyst for Intramolecular Diels-Alder reactions; enantioselective synthesis; borylation reactions; hydrohydrazination and hydroazidation as well as for oxidative carbonylation of phenol.Mn-doped anatase TiO2 (Mn: 1.2, 2.4 at%) thin films were grown on Si(100) via atomic layer deposition. The synthesis utilized Ti(OCH(CH3)2)4 and H2O as ALD precursors and Mn(DPM)3 as a dopant source.

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CAS 14324-99-3 | Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III)

CAS 14324-99-3 | Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III)

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